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    日本YAMATO等離子清洗機PR500/510

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    產(chǎn)品型號PR500/PR510

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    日本YAMATO等離子清洗機PR500/510

    詳細介紹

    日本YAMATO等離子清洗機PR500/510：

    Gas Plasma Etcher
    PR500/PR510
    Model
    500 510
    Method
    Barrel type of DP
    DP : direct plasma
    High-frequency Output
    Max.500W
    Oscillating Frequency
    13.56MHz
    Reaction Chamber
    ?215×305mm

    The PR500/510 isagasplasma device that is used widely for such applicationsasproductionof semiconductors and analysis work. Itboastsoutstandingoperability and safety, with an automatic tuningsystemas a standardcomponent and other features.

    • It has a compact design,withasmall-size HF generator and an oscillation sectionintegratedwitha portion of the chamber.
    • With the 215mm diameterlargecaliberchamber, the unit can process bigtestingsamples.


    *    The gas plasmaequipment has a wide range ofapplications fromashing, etching,dry cleaning,etc.


    * Reaction Chamber Control Panel

    PR500 Reaction Chamber
    *     Withthe215mm diameter large caliberchamber


    * FORWARD/REFLECT indicatebydigital


    * Operation Flowchart
    Piping System Diagram


    Specifications
    Model PR500 PR510
    *Method Barrel type of direct plasma
    * Controlpart
    Highfrequency output Max.500W
    Oscillating frequency 13.56MHz
    Outputimpedance 50Ω
    Tuningmethod Automatic tuning
    Instrument Output watt meter (0 to 600W)
    Reflected wave watt meter (0 to 300W)
    Vacuum gauge, thermocouple type
    Flow meter, needle valve integrated type, 2 sets
    Timer 0.1sec. to 999h
    Gasinlet 1/4"stainless steel, 2 inlet
    Powersource (50/60Hz) AC100/220V, single phase, 2 kVA
    * Reactionpart
    Reactionchamber Madeof quarts, φ215×305mm
    Electrodestructure Condenser type, 4-way split
    Controlsystem Autopressurereduction, auto leak valve TouchpanelwithPLC control
    Pipingmaterial SUS,Teflon
    Externaldimensions(W×D×Hmm) 438×520×760 520×630×760
    Weight Approx.38kg Approx.60kg
    * StandardAccessories
    • Connection cable :1completeset
    • Vacuum grease : 1 pc.
    • O-ring for reaction chamber:1pc.
    * OptionalAccessories
    * Frame for wafers, 2, 3,4,5, 6 inches * Multipurposeangledframe
    * Aluminum etchingtunnel*Stand

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